热致变色VO_2薄膜的制备及光学性能研究

Preparation and optical properties of thermochromic VO_2 thin films

利用等离子体发射光谱监测系统(PEM)控制钒的等离子强度,在石英基底上磁控溅射制备了VO2薄膜。采用XRD、XPS、SEM、紫外-可见-近红外分光光度计及傅立叶红外分光光度计研究薄膜的结构、光学及相变特性。结果表明,所制备的VO2薄膜具有(011)取向,VO2薄膜的热滞回线宽度为25℃,可见光透过率和太阳光调节率分别可达Tlum,l=34.1%、Tlum,h=35.3%和ΔTsol=6.8%,相变前后,红外光区的反射率变化最大值可达44.4%。

Vanadium dioxide （VO2） thin film was deposited on quartz glass by magnetron sputtering. The plasma emission monitoring （PEM） was used to control the plasma emission intensity of vanadium during the ex periment. Investigations on the structure, optical properties and phase transition performance of the films using XRD, XPS, SEM,UV-Vis-NIR spectrophotometer and Fourier infrared spectrophotometer. The results show that the VO2 films have the （011） orientation, with the width of the hysteresis loop was 25℃. A sample with balanced luminous transmittance （△lum） and switching efficiency （△Tsol） of the films are about 34.1 %（20℃） and 35.3 %（90℃）, and 6. 8%（△sol） ,respectively. At the phase transition process, the maximum variation of reflectance in infrared regions up to 44.4%.