摘要
EB-PVD是以高能电子束为热源的一种蒸发镀膜技术。在真空的环境下,高能离子束轰击靶材(金属,陶瓷等),使其融化、升华、蒸发,最后沉积在基片上。由于EB-PVD技术具有蒸发和沉积速率高,涂层致密,化学成分易于精确控制,可得到柱状晶组织,无污染,热效率高,基片与薄膜之间有较强的结合力等诸多优点,已被广泛应用于国防和民用领域。本文介绍了EB-PVD技术在制备热障涂层时优势、不足与改进措施。
Electron beam physical vapor deposition （EB-PVD） is a vacuum evaporation technology with high-energy electron beam as heat source.In a vacuum environment,the target material （metal,ceramic,etc） is bombarded,melted,sublimated and finally deposited on the substrate by the high energy ion beam.EB-PVD is now widely used in national defense and civilian areas for its high evaporation rate,dense coating,easy to control the chemical composition,high thermal efficiency,strong adhesive force and no pollution.The advantages,insufficient and improvement measures of EB-PVD technology are introduced for preparation of thermal barrier coatings in this paper.
出处
《真空》
CAS
2013年第5期6-8,共3页
Vacuum
关键词
电子束物理气相沉积
热障涂层
工艺特点
改进
electron beam physical vapor deposition
thermal barrier coatings
technical characteristics
improvement
