期刊文献+

高能电子照射对金刚石中缺陷电荷状态的影响 被引量:2

Effect of high-energy electron exposure on the charge states of defects in diamond
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摘要 金刚石经电子辐照后会形成大量的点缺陷,而这些缺陷很多都是带有电荷的.提出一种用于研究缺陷电荷状态的新思路,即利用扫描电子显微镜(SEM)的高能电子照射辐照区域,通过比较SEM照射前后的低温光致发光光谱,为缺陷电荷状态的确定提供了一些依据. A great number of point defects are created in diamond by electron irradiation, most of which are charged. In this paper, we come up with an interesting thought to determine the charge states of these defects in diamond. The irradiated regions are exposed by high-energy electrons with a scanning electron microscopy (SEM), and then are characterized by the low temperature micro- photoluminescence (PL) technology. Some evidences to determine the charge states of defects are obtained by comparing the PL spectra between the cases with and without SEM exposure.
出处 《物理学报》 SCIE EI CAS CSCD 北大核心 2013年第18期438-442,共5页 Acta Physica Sinica
基金 太原科技大学博士科研启动项目(批准号:20122044) 太原科技大学校级UIT项目(批准号:xj2013065)资助的课题~~
关键词 金刚石 点缺陷 电荷状态 diamond, point defect, charge state
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参考文献18

  • 1王凯悦,李志宏,高凯,朱玉梅 2012 物理学报 61 097803.
  • 2Dai Y, Dai D, Yan C, Huang B, Han S 2005 Phys. Rev. B 71 075421.
  • 3Dai Y, Zhang A, Han S 2004 Int. J. Nanosci. 3 455.
  • 4Steeds J W, Charles S J, Davis T J, Griffin I 2000 Diamond Relat. Mater. 9 397.
  • 5Manson N B, Harrison J P 2005 Diamond Relat. Mater. 14 1705.
  • 6Grotz B, Hauf M V, Dankerl M, Naydenov B, Pezzagna S, Meijer J, Jelezko F, Wrachtrup J, Stutzmann M, Reinhard F, Garrido J A 2012 Nature Communications 3 729.
  • 7Reimer L 2000 Meas. Sci. Technol. 11 1826.
  • 8Wotherspoon A, Steeds J W, Coleman P, Wolverson D, Davies J, Lawson S, Butler J 2002 Diamond Relat. Mater. 11 692.
  • 9Wang K, Steeds J, Li Z 2012 Diamond Relat. Mater. 25 29.
  • 10Steeds J, Wang K, Li Z 2012 Diamond Relat. Mater. 23 154.

共引文献1

同被引文献40

  • 1Gerum W, Bruck M, Fischer G, Henry D, Rothacker H P 2005 IEEETrans. on ED 52 669.
  • 2Liao F J 1999 Vacuum Electronics (Beijing: Electronics Industry Press) (in Chinese).
  • 3Theiss A J, Meadows C J, True P B 2007 IEEE Trans. on ED 54 1054.
  • 4Ghosh T K, Challis A J, Jacob A, Bowler D, Carter R G 2008 IEEETrans. on ED 55 668.
  • 5Han Y, Liu Y W, Ding Y G, Liu P K 2009 Acta Phys. Sin. 58 1806 (in Chinese).
  • 6Crivello R, Richard W, Grow R 1988 IEEE Trans. on ED 35 1701.
  • 7Wei P,Zhou M G,Zhu L,Zhang J 2013 Acta Phys. Sin. 62 317 (in Chinese).
  • 8Liu Y W, HanY 2011 J. Vac. Sci. Technol. 31 424 (in Chinese).
  • 9Xu X, Wei Y Y, Shen Fi, Huang M Z, Tang T, Duan Z Y, Gong Y B 2012 Chin. Phys. B 21 068402.
  • 10Gu S S, Hu X J, Huang K 2013 Acta Phys. Sin. 62 512 (in Chinese).

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