一种太阳电池纳米陷光结构的制备方法

Preparing method of nano-light trapping structure for solar cells

提出了一种利用石墨纳米颗粒作为掩膜,通过金属辅助刻蚀来制备具有低反射率的太阳电池纳米陷光结构的方法。用该方法制得了一种表面覆盖有纳米线和纳米孔的太阳电池纳米陷光结构。结合金属辅助刻蚀的机制和这种陷光结构的形成原理,分析了石墨纳米颗粒和H2O2浓度对陷光结构形貌的影响,并讨论了陷光结构的形貌对样品陷光性能的影响。最后,制得了在300～1100nm波长范围内平均反射率仅为3.6%的太阳电池陷光层。

In this paper, a method for preparing a low reflectivity nano-light trapping structure of solar cell was proposed. We used graphite nanoparticles （GNPs） as a mask, afterwards, the metal assisted etching method was used to prepare the nano-light trapping structure. By this method, a nano-light trapping structure of solar cell was obtained, which was covered with nanowires and nanoholes. According to the metal-assisted etching mechanism and the formation principle of this light trapping structure, the influences on different morphologies of the light trapping structure prepared under different GNPs and H2 02 concentrations were analyzed. And the morphology＇s impacts of the light trapping structure on antireflection were discussed. Finally, only 3.6% re- flectance of the light trapping layer in the range of 300-1100nm was obtained.