离子注入后小麦种子表皮细胞的扫描电镜观察

SEM of the Wheat Seed's Surface Cell Implanted by Kev Ion Beam

应用扫描电镜观察了低能氮离子注入小麦干种子后表层细胞结构的变化。结果表明,离子注入对小麦表皮细胞有明显的损伤作用。随着离子剂量的增大,离子对种子细胞的损伤程度增大,且种子表面有孔洞出现。

The changes of the surface cell structure on the wheat seeds were observed through the SEM. It shows that,in some degree,the fields which were implanted by the low energy N＋ were different from those were not implanted, and some surface cells were impaired. The higher dose, the more serious injury. When the dose of the ion beam is large enough ,there will be hole in the surface of the wheat seed.