期刊文献+

InAs/GaAs量子点生长中应力分析

An Analysis of the Strain in Growth InAs/GaAs Quantum Dots
下载PDF
导出
摘要 围绕InAs(InGaAs)/GaA叠层量子点电池的制作,本文通过文献研究和对近邻面生长实验研究认为,InAs/GaAs量子点生长形貌和特性受生长环境条件和生长条件影响。其中,客观、不可改变的外延层与衬底晶格常数、生长台面、超晶格结构等环境条件对量子点生长最为重要。这些环境条件通过生长应力,决定了量子点生长中的有序成核、生长、合并,直至出现缺陷的多晶体生长,其作用贯穿整个量子点生长过程。 Around InAs(InGaAs)/GaA stacked quantum dot cell production,the paper studies the growth of neighboring surfaces by literature research and experiment and deems that InAs/GaAs quantum dots growing morphology and growth characteristics are affected by growing conditions and environmental conditions.Among them,the objective,immutable epitaxial layer and the substrate lattice constant,growth countertops,and other environmental conditions super-lattice structure of quantum dot growth are most important.Growing environmental conditions determine the order nucleation,growth,consolidation,until the defected polycrystalline grows and quantum dots works throughout the whole growing process.
出处 《文山学院学报》 2013年第3期42-44,48,共4页 Journal of Wenshan University
基金 云南省科技计划重点项目(2009CC012) 楚雄师范学院学术后备人才项目(11YJRC19)
关键词 INAS GaAs量子点 SK模式生长 量子点生长因素 应变作用 量子点叠层电池 InAs/GaAs quantum dots S-K growth environmental of quantum dot growth train affect multiple quantum dot solar cell
  • 相关文献

参考文献8

  • 1杨红波,俞重远,刘玉敏,黄永箴.影响半导体量子点生长因素的分析[J].人工晶体学报,2004,33(6):1018-1021. 被引量:7
  • 2Ruvimov S,Werner P,Scheerschmidt,et al.Structural characterization of(In,Ga)As quantum dots in a GaAs matrix[J].Phys.Rev.B,1995 (51):14766-14769.
  • 3Leonard D,Krishnamurthy M,Reaves C M,et al.Direct formation of quantum-sized dots from uniform coherent islands of InGaAs on GaAs surfaces[J].Appl.Phys.Lett,1993 (23):3203-3205.
  • 4张春玲,赵凤瑷,徐波,金鹏,王占国.利用GaAs基上InGaAs应变层制备有序排列的InAs量子点[J].Journal of Semiconductors,2004,25(12):1647-1651. 被引量:1
  • 5Fumito H,Koichi Y.Selective growth of self-organizing InAs quantum dots on strained InGaAs surfaces[J].Appl Surf Sci,1998,737:130-132.
  • 6Xie Q,Madhukar A,Chen P.Vertically self-organized InAs quantum dots on GaAs (100)[J].Phys Rev Lett,1995,75:2542.
  • 7Liang S,Zhu H L,Pan J Q,et al.Growth of InAs quantum dots on vicinal GaAs (1 0 0) substrates by metalorganic chemical vapor deposition and their optical properties[J].Journal of Crystal Growth,2006 (289):477-484.
  • 8Zh.M.Wang S S J H.Surface ordering of (In,Ga)As quantum dots controlled by GaAs substrate indexes[J].Appl.Phys.Lett,2004 (85):5031.

二级参考文献30

  • 1荻野俊郎 本间芳和.半导体表面的原子结构设计〔日文〕[J].日本物理学会志,2001,56:83-90.
  • 2王志明,邓元明,封松林,吕振东,陈宗圭,王凤莲,徐仲英,郑厚植,高旻,韩培德,段晓峰.自组织生长多层垂直耦合InAs量子点的研究[J].Journal of Semiconductors,1997,18(7):550-553. 被引量:5
  • 3Beanland R,Aindow M,Joyce T B,et al.A study of surface cross-hatch and misfit dislocation structure in In0.15 Ga0.85 As/GaAs grown by chemical beam epitaxy.J Cryst Growth,1995,149:1
  • 4Barnett S J,Keir A M,Johnson A D,et al.In situ X-ray topography studies during the molecular beam epitaxy growth of InGaAs on (001) GaAs: effects of substrate dislocation distribution on strain relaxation.J Phys D,1995,28:A17
  • 5Dunstan D J,Kidd P,Beanland R,et al.Predictability of plastic relaxation in metamorphic epitaxy.Mater Sci Technol,1996,12:181
  • 6Matthews J W,Blankeslee A E,Mader S.Use of misfit strain to remove dislocations from epitaxial thin films.Thin Solid Films,1976,33:253
  • 7Toyoshima H,Niwa T,Yamazaki J,et al.In surface segregation and growth-mode transition during InGaAs growth by molecular-beam epitaxy.Appl Phys Lett,1993,63(6):821
  • 8Lin Dongliang. Crystal defect. Shanghai: Shanghai Jiaotong University Publishing Company,1996(in Chinese)[林栋梁.晶体缺陷.上海:上海交通大学出版社,1996]
  • 9Xie Q H,Madhukar A,Chen P,et al.Vertically self-organized InAs quantum box islands on GaAs(100).Phys Rev Lett,1995,75:2542
  • 10Koo H C,Ju P Y,Kyu E K,et al.Selective formation of one- and two-dimensional arrayed InGaAs quantum dots using Ga2O3 thin film as a mask material.Appl Phys Lett,1998,73(17):2479

共引文献6

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部