摘要
综述了多重图形技术的研究进展,简述了多重图形技术的目的和意义。首先,按照技术特征,将多重图形技术分为纯间距分离技术、纯间距分割技术和间距分离分割混合技术。然后,介绍了三种多重图形技术的代表性工艺流程,并展开介绍了纯间距分割技术。最后,从工艺效果、成本评估和适用范围等方面比较了各种技术的优劣,给出了多重图形技术选择的建议,并对多重图形技术的趋势进行了展望,指出纯间距分割多重图形技术,将是实现40 nm以下间距的最优途径。
The research progresses of multiple patterning techniques are reviewed, and the purpose and significance of multiple patterning techniques are introduced briefly. Firstly, according to the technical characteristics, the multiple patterning techniques are divided into three parts, i.e. pure pitch split technique, pure pitch division technique and pitch spilt division hybrid technique. And then, the typical process flow of the three multiple patterning techniques is introduced, and the pure pitch division technique is introduced widely and deeply. Finally, the advantages and disadvantages of these techniques are compared in terms of the process performance, cost evaluation and applicability. And the recommendation for choosing these techniques is given.Besides that, the future trend of the multiple patterning techniques is prospected, and it is pointed out that the pure pitch division technique should be the best solution to obtain the pitch below 40 nm.
出处
《微纳电子技术》
CAS
北大核心
2013年第10期656-661,共6页
Micronanoelectronic Technology
基金
国家科技重大专项(2011ZX02502-004)
关键词
多重图形技术
纯间距分离技术
纯间距分割技术
间距分离分割混合技术
先进图形技术
微缩化技术
图形转移
multiple patterning technique
pure pitch split technique
pure pitch division technique
pitch split division hybrid technique
advanced patterning technology
shrinking technology
pattern transfer