反应磁控溅射方法制备BCN薄膜的高温抗氧化性

Oxidation Resistance Behavior of BCN Films Prepared by Reactive Magnetron Sputtering

为了考察BCN薄膜的高温抗氧化,用反应磁控溅射方法在高速钢基体上制备了BCN硬质薄膜材料,用X射线衍射仪(XRD)、高分辨透射电镜(HRTEM)、扫描电镜(SEM)、傅里叶变换红外光谱(FTIR)和显微硬度计等方法研究了BCN薄膜的高温抗氧化行为。结果表明:BCN薄膜在500℃以下具有较好的抗氧化性能,氧化温度高于600℃,薄膜被严重氧化,薄膜中C含量的增加使薄膜的高温抗氧化性能降低。分析认为,薄膜在500℃以下氧化时,氧气在薄膜内的扩散比较困难,薄膜不易被氧化;当氧化温度高于600℃时,由于薄膜中的C-C键和C-N键被氧化,在薄膜中留下较多的微孔,这些微孔能为氧气扩散提供快速通道,加速薄膜的氧化。

The BCN films were deposited on HSS substrates by reactive magnetron sputtering （ AEMS） .The oxi-dation behavior of BCN films was studied by X ray diffraction （XRD）, High-resolution transmission electron microscopy （HRTEM）,scanning electron microscope （SEM）, Fourier-transform infrared absorption （FTIR）, and micro-hardness indentation .The results indicated that the BCN films has good oxidation resistance below 500℃, however , further increase of the annealing temperature to 600℃leads to its oxidation or decomposition of BCN films, and higher carbon content in the films is found harmful to the oxidation resistance of the BCN films .It is considered that oxygen cann ’ t diffuse easily in the BCN films , and the films cann ’ t be oxidized easi-ly at 500℃, however , when the annealing temperature is higher than 600℃, the C-C chemical bonds and C -N chemical bonds can be oxidized easily , and lots of micro-voids occure in the films .These micro-voids pro-vide hyperchannel for oxygen diffusion , and the oxidation process of the films is speeded .