三氧化钼薄膜的制备及其光学性质研究(英文)

Preparation and optical properties of molybdenum trioxide films

采用离子交换和化学沉淀法在玻璃基底表面成功合成了h-MoO3和α-MoO3薄膜.分别用XRD、SEM等手段对产物进行表征,通过荧光光谱和紫外可见光谱对MoO3薄膜的光学性质进行了详细的研究.结果表明:h-MoO3薄膜有两个荧光峰,分别位于440、630 nm;α-MoO3薄膜仅在440 nm处有一个荧光峰.440 nm处的荧光发射峰来自于MoO3的导带-价带电子跃迁,630 nm处的发射峰来源于h-MoO3薄膜中氧空穴的存在.所制备薄膜的光致变色研究表明,相对于α-MoO3薄膜来说,h-MoO3薄膜具有更好的光致变色响应,这与h-MoO3的特殊结构中的某些氧空穴和缺陷有关.

Metastable h-MoO3 and thermodynamically stable α-MoO3 films were successfully fabricated on the surface of glass substrates by two ways ： ion exchange and chemical deposition. The as-synthesized products were characterized through X-ray diffraction （XRD） and scanning electron microscopy （SEM）. The optical properties of the MoO3 films were investigated by fluorescence spectrum and UV-Vis spectrum in detail. The result showed that h-MoO3 film has two fluorescence emission peaks at 440 and 630 nm, respectively, but a-MoO3 film just has one at 440 nm. The emission peak at 440 nm might come from the band-to-band transition of MOO3, and the emission peak at 630 nm probably originated from the presence of oxygen vacancies of h-MoO3 film. The photochromic behavior of the as-prepared films was also observed which h-MoO3 film exhibited higher photochromic response than α-MoO3 film. It was related to some defects of oxygen vacancies in the especial h-MoO3 structure.