摘要
介绍了蓝宝石晶片的清洗原理;通过分析蓝宝石的表面净化原理和对湿法腐蚀清洗工艺试验的研究,提出了一种适用于工业化生产蓝宝石晶片的清洗剂和净化工艺,满足了LED领域的蓝宝石晶片表面洁净度要求。
The cleanliness principle of sapphire wafer is expounded in detail. By analyzing the sapphire surface purification principles and researching wet etching cleaning process. A suitable for industrial production of sapphire wafer cleaning agents and purification process are proposed. It meets the field of LED sapphire wafer surface cleanliness requirements.
出处
《电子工业专用设备》
2013年第9期8-10,58,共4页
Equipment for Electronic Products Manufacturing
关键词
蓝宝石晶片
净化工艺
清洗剂
湿法腐蚀
Sapphire wafer
Purification process
Cleaning agents
Wet etching
