摘要
对 Si O2 掺杂的 Sn O2 · Co O· Nb2 O5 压敏电阻非线性电学性质进行了研究 ,并对其微观结构进行了电镜扫描 ,且对其晶界势垒高度进行了测量。实验表明 x(Si O2 ) =0 .3%掺杂的 Sn O2 · Co O· Nb2 O5 压敏电阻的非线性系数 α高达 30 ,并且具有最高的击穿电场 (375 V/ mm)。采用 Gupta- Carlson缺陷模型对晶界肖特基势垒高度随Si O2 的添加而变大的现象进行了理论解释。
The effect of SiO 2 addition on the nonlinear electrical properties of the SnO 2·CoO·Nb 2O 5 Varistor System was investigated.The SnO 2·CoO·Nb 2O 5 varistor added with 0 3% SiO 2 has the nonlinear coefficient of α =30 and the highest breakdown electric field among the SiO 2 doped SnO 2·CoO·Nb 2O 5 varistor.To find the reason why the SnO 2·CoO·Nb 2O 5 varistor added with 0 3% SiO 2 has such a characteristic,the microstructures of the SiO 2 doped SnO 2·CoO·Nb 2O 5 varistors were examined,the voltage barrier height φ b at the grain boundaries for the SiO 2 doped SnO 2·CoO·Nb 2O 5 varistors were determined and the Gupta and Carlson defect model was considered.
出处
《压电与声光》
CSCD
北大核心
2000年第6期379-381,共3页
Piezoelectrics & Acoustooptics
基金
国家自然科学基金资助项目!(5 0 0 72 0 13)
关键词
压敏电阻
二氧化硅
非线性电学性质
varistor
nonlinear coefficient
brokendown electric field
potential barrier