双靶磁控溅射共沉积V-C-Co薄膜的结构及力学性能

Microstructures and Mechanical Properties of Co-Sputtered V-C-Co Coatings

通过双靶磁控溅射共沉积法，在硅（100）和康宁玻璃基片上制备了一系列不同Co含量（原子含量0～27．2％）的V-C-Co薄膜，并分别用扫描电子显微镜及其附带的X射线能谱仪分析了薄膜的生长结构及成分，用X射线衍射仪分析了薄膜的相组成，用纳米压痕仪分析了薄膜的力学性能。结果表明，Co在V-C-Co中以非晶的形式存在，且Co的加入会使VC晶粒尺寸变小，V-C-Co结晶性变差。随着Co含量的增加，薄膜呈现出较好的综合机械性能，且在含量为11．9％时达到最优。

The V-C-Co coatings were deposited by magnetmn co-sputtering of the V-C ceramic and Co targets, on Si （100） and Coming glass substrates. The impacts of the deposition conditions on the mechanical properties were evaluated. The V-C-Co coatings were characterized with X-ray diffraction, scanning electron microscopy, energy dispersive spectroscopy, and conventional mechanical probes. The results show that the Co content significantly affects the microstructures and mechanical properties of the coatings. For instance, the amorphous Co inversely influenced the crystalline structures of the V-C-Co coating and reduced the V-C grain sizes. As the Co content increased, the plasticity increased sharply, accompanied by a decrease of surface hardness. At a compromised Co content of 11.9 % （at）, the hardness and plasticity index of coating were found to be 22 GPa and 0.53,respectively.