沉积温度和氩气压力对钛薄膜物相结构和性能的影响

Effects of Deposition Temperature and Ar Pressure on Phase Structure and Properties of Ti Films

采用多弧离子镀方法在低温（166K）、室温（300K）以及不同氩气压力（0．2～0．8Pa）条件下沉积钛薄膜，通过X射线衍射仪、原子力显微镜、显微硬度计和划痕试验机等对薄膜的物相结构和性能进行了研究。结果表明：不同工艺条件下沉积的钛薄膜均为密排六方纳米晶ω-Ti和ω-Ti的两相复合相结构；在低温、低氩气压条件下沉积的钛薄膜具有较高含量的硬脆∞相，因而具有较高的显微硬度，同时还表现出良好的膜基结合性能，比较适宜用作固体润滑薄膜与钢基体间的过渡层，以改善其膜基结合性能和承载能力。

Ti films were deposited at low temperature （166 K） and room temperature （300 K） under different Ar pressures of 0. 2-0. 8 Pa by arc ion plating （AIP）. The phase structure and properties of the Ti films were studied using X-ray diffraction （XRD）, atomic force microscope （AFM）, microhardness tester and scratch tester. The results show that the Ti films deposited at various deposition conditions had a two-phase nanocomposite structure of hexagonal closed-packed （hcp） ω- Ti and ω-Ti phases, and showed an increase in the relative content of co phase with decreasing deposition temperature and Ar pressure. Thus the Ti films, deposited at lower temperature and Ar pressure, presented a higher microhardness because the co phase is a hard brittle phase, and a better adhesion with steel substrate. Therefore, the Ti films deposited at lower temperature and Ar pressure were feasible for interlayers between solid lubricating films and steel substrates to improve their adhesion and load carrying capacity.