a-C:H膜的高真空磨损失效机制研究——应力的影响

The Wear Failure Mechanism of a-C:H Film in High Vacuum——Effect of Stress

采用中频非平衡磁控溅射法沉积了含氢无定形碳(a-C:H)薄膜,利用球-盘摩擦试验机考察了不同载荷下薄膜在高真空中(5.0×10-3Pa)的摩擦磨损行为,通过对磨损表面的分析以及相关的验证实验,探讨了应力(接触应力、薄膜内应力)对薄膜在高真空中摩擦磨损行为的影响.结果表明:在高真空中,随着载荷的增加,薄膜的摩擦系数逐渐降低,而耐磨寿命却急剧缩短;在高真空高接触应力下,无论是摩擦还是静压,薄膜表面均出现了明显的应力释放花样.因此可以认为,薄膜在高真空中的磨损失效与其在高接触应力下的内应力释放有密切关系.

The amorphous hydrogenated carbon （a-C： H） film was deposited by medium frequency unbalanced magnetron sputtering. The tribological properties of the film in high vacuum （5.0 ×10^-3 Pa） under different applied loads were evaluated by using a pin - on - disk tribometer. The influence of stress （ contact stress and internal stress） on vacuum trihological properties of the film was investigated by observing the worn surface and the verified experiments. The results show that both the friction coefficient and sliding lifetime of the film decreased with increasing applied load. The surface of the film showed significant stress relaxation pattern under either friction or static pressure condition in high vacuum with high contact stress. Therefore, it can be regarded as that the extremely short sliding lifetime of the film in vacuum was closely related with the relaxation of internal stress under high contact stress.