摘要
本文通过倒筒式直流对靶溅射 (ICP)方法 ,在 3英寸范围内LaAlO3 和蓝宝石 (Al2 O3 )单晶基片上成功实现了两面同时沉积YBCO(YBa2 Cu3 Oy)高温超导外延薄膜 ,其TC0 =88~ 91K ,JC=1~ 5× 10 6A/cm2 ,RS(77K ,145GHz) =2 0~ 40mΩ ,双面薄膜的两面一致性和面内均匀性都非常良好 ,可以满足微波器件研制的要求 .
Epitaxial YBCO(YBa 2Cu 3Oy) thin film of large area sized at Φ30mm 3 inch are deposited at the same time on LaAlO 3 and sapphire substrates by inverted cylindrical opposited target sputtering technology (ICP).These films show the values of T C0 =88~91K,J C=1~5×10 6A/cm 2,R S(77K,145GHz)=20~40mΩ.The homogeneity of film at any side and reproducibility of film at both sides are good enough,to be applicable in microwave devices.
出处
《电子学报》
EI
CAS
CSCD
北大核心
2000年第12期131-132,共2页
Acta Electronica Sinica