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The growth and characterization of GaN films on cone-shaped patterned sapphire by MOCVD

The growth and characterization of GaN films on cone-shaped patterned sapphire by MOCVD
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摘要 GaN films are grown on cone-shaped patterned sapphire substrates (CPSSs) by metal-organic chemical vapor deposition, and the influence of the temperature during the middle stage of GaN growth on the threading dislocation (TD) density of GaN is investigated. High-resolution X-ray diffraction (XRD) and cathodeluminescence (CL) were used to characterize the GaN films. The XRD results showed that the edge-type dislocation density of GaN grown on CPSS is remarkably reduced compared to that of GaN grown on conventional sapphire substrates (CSSs). Furthermore, when the growth temperature in the middle stage of GaN grown on CPSS decreases, the full width at half maximum of the asymmetry (102) plane of GaN is reduced. This reduction is attributed to the enhancement of vertical growth in the middle stage with a more triangular-like shape and the bending of TDs. The CL intensity spatial mapping results also showed the superior optical properties of GaN grown on CPSS to those of GaN on CSS, and that the density of dark spots of GaN grown on CPSS induced by nonradiative recombination is reduced when the growth temperature in the middle stage decreases. GaN films are grown on cone-shaped patterned sapphire substrates (CPSSs) by metal-organic chemical vapor deposition, and the influence of the temperature during the middle stage of GaN growth on the threading dislocation (TD) density of GaN is investigated. High-resolution X-ray diffraction (XRD) and cathodeluminescence (CL) were used to characterize the GaN films. The XRD results showed that the edge-type dislocation density of GaN grown on CPSS is remarkably reduced compared to that of GaN grown on conventional sapphire substrates (CSSs). Furthermore, when the growth temperature in the middle stage of GaN grown on CPSS decreases, the full width at half maximum of the asymmetry (102) plane of GaN is reduced. This reduction is attributed to the enhancement of vertical growth in the middle stage with a more triangular-like shape and the bending of TDs. The CL intensity spatial mapping results also showed the superior optical properties of GaN grown on CPSS to those of GaN on CSS, and that the density of dark spots of GaN grown on CPSS induced by nonradiative recombination is reduced when the growth temperature in the middle stage decreases.
出处 《Journal of Semiconductors》 EI CAS CSCD 2013年第11期20-24,共5页 半导体学报(英文版)
基金 supported by the National Natural Science Foundation of China(Nos.61076052,60906006) the State Key Development Program for Basic Research of China(No.2012CB619303) the National High Technology Research and Development Program of China(No.2011AA050514)
关键词 GAN threading dislocation patterned sapphire substrate metal-organic chemical vapor deposition GaN threading dislocation patterned sapphire substrate metal-organic chemical vapor deposition
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  • 1Wang X L, Wang C M, Hu G X, et al. hnproved DC and RF pertbrmance ofAIGaN/GaN HEMTs grown by MOCVD on sap- phire substrates. Solid-State Electron, 2005, 49(8): 1387.
  • 2Ponce F, Bour D. Nitride-based semiconductors tbr blue and green light-emitting devices. Nature, 1997, 386(6623): 351.
  • 3Zhang Xiaobin, Wang Xiaoliang, Xiao Hongling, et al. In- GaN/GaN multiple quantunl well solar cells with an enhanced open-circuit voltage. Chin Phys B, 2011,2(1(2): 028402.
  • 4Elsner J, Jones R, Sitch P K, et al. Theory of threading edge and screw dislocations in GaN. Phys Rev Lett, 1997, 79( 19): 3672.
  • 5Sugahara "1", Hao M, Wang T, et al. Role of dislocation in lnGaN phase separation. Jpn J Appl Phys, 1998, 37:L1195 Sakai A, Sunakawa H, Usui A. Defect structure in selectively grown GaN films with low threading dislocation density. Appl Phys Lett, 1997, 71(16): 2259.
  • 6Kato Y, Kitamura S, Hiramatsu K, et al. Selective growth of wurtzite GaN and AlxGal-xN oil GaN/sapphire substrates by metalorganic vapor phase epitaxy. J Cryst Growth, 1994, 144(3/4): 133.
  • 7Kitamura S, Hiramatsu K, Sawaki N. Fabrication orGaN hexag- onal pyramids on dot-patterned GaN/sapphire substrates via se- lective metalorganic vapor phase epitaxy. Jpn J Appl Phys, 1995, 34: El 184.
  • 8Feng Z H, Qi Y D, Lu Z D, et al. GaN-based blue light-emitting diodes grown and fabricated on patterned sapphire substrates by metalorganic vapor-phase epitaxy. J Cryst Growth, 2004, 272( 1- 4): 327.
  • 9Tadatomo K, Okagawa H, Ohuchi Y, et al. High output power lnGaN ultraviolet ligbt-emitting diodes fabricated on patterned substrates using metatorganic vapor phase epitaxy. Jpn J Appl Phys, 2001, 40:L583.
  • 10Gao H. Yan F, Zhang Y, et al. Enhancement of tile light output power of InGaN/GaN light-emitting diodes grown on pyramidalpatterned sapphire substrates in the micro- and nanoscale. J Appl Phys, 2008, 103(1): 014314.

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