摘要
精密长光栅作为高档数控机床中的核心部件,其制造能力和精度直接决定高精密机床的制造水平.本文对纳米滚压印技术制造长光栅中的核心部件——圆柱母光栅的制造开展研究,建立了高精度的母光栅刻划制造平台,保证了母光栅制造的精度要求;分析了微尺度毛刺的形成机理和抑制方法,对母光栅材料选择及微尺度刻划工艺参数进行了优化,实现了直径110 mm,周期分别为20μm、10μm和4μm整圈圆柱母光栅的高精度微刻划制造.母光栅刻划总条数为数万条,4μm周期母光栅连续刻划时间超过62 h,最终实现母光栅的首尾拼接误差控制小于300 nm.另外,针对滚压印加工中的填充问题,利用聚焦离子束(FIB)技术制备了V形、梯形等形状金刚石刀具,获得了良好的光栅压印结果.
As a core device of high precision computer numerical control (CNC) machine tools, large scale micropitch grating directly determines the level of the manufacturing capacity of CNC machine tools. And it is a viable technology innovation to use nanoimprint roller technology to achieve highpreci sion largescale micropitch grating. In this paper, a precision experiment machining platform was estab lished for manufacturing the cylindrical grating template. And great efforts were made to improve the mi crofabricating process, and the parameters and materials were optimized during the experiments. With various factors, such as efficiency, quality of cutting, quality of nanoimprint, considered, the 20μm, 10 μmand 4μmpitch precision microcuttings of roller grating template in a full circle with the diameter of 110 mm were achieved. The number of the grooves is more than ten thousand, and the cutting time is over 62 h in the 4 μm pitch cutting process. The total splice error of the roller grating template is less than 300 mm. To solve the problem of insufficient filling during the nanoimprint, the Vshaped and trap ezoid diamond tools were fabricated by focused ion beam (FIB) technology, and good nanoimprint resuhs were obtained.
出处
《纳米技术与精密工程》
CAS
CSCD
2013年第6期473-478,共6页
Nanotechnology and Precision Engineering
基金
国家自然科学基金资助项目(50935001
51275559)
工信部科技重大专项资助项目(2011ZX04014-071)
关键词
微纳制造
纳米压印
微刻划
母光栅
micro/nano manufacturing
nano-imprint
micro-cutting
grating template