全息干涉法制备的光子晶体带隙特性研究

Optimized holographic design of hexagonal photonic crystals with two exposures

提出了一种利用两次曝光的全息干涉技术提高光子晶体全带隙的方法,通过两次曝光可以适当调整晶格中介质柱的大小和形状,并可以改变光子晶体的对称性,有效地提高光子能带性质。以两种混合三角光子晶体结构为例进行计算,研究表明经过适当优化的结构在很宽的系统参数范围内有全光子带隙存在,并通过引入线缺陷模拟验证了全带隙的存在。

Proposed a method of fabrication Photonic crystals, using two step exposure to change the symmetry property of Pcs in holography lithography. Results show that the width of Photonic band gaps would be increased with lower symmetry property and appropriate chosen of column shapes, and even complete band gaps would appear over a wide range of Intensity threshold for several structures. FDTD simulations of a line defect in PCs as a waveguide demonstrate the presence of band gaps.