摘要
研制了一台高性能双极性脉冲非平衡磁控溅射(MS)电源。该电源以FPGA为控制系统核心,采用交变脉冲单元实现双极性脉冲输出,并针对脉冲条件下的等离子体负载特性及MS工艺需求,设计了负载匹配电路、多级电弧管理策略和数字脉冲复合调制(DPCM)策略。搭建一台10 kW样机并进行了测试,结果表明该电源具备多变量脉冲输出特性及良好的电弧管理能力,为MS工艺的研究与探索提供了重要的技术支撑。
A high-performance bipolar pulsed unbalanced magnetron sputtering（MS） power supply is developed.The po- wer supply uses the FPGA as core of control system, implements the bipolar pulse with alternative pulse unit, and de- signs the load matching circuit, multistage are manage strategy and digital pulse complex modulation （DPCM） strategy to meet the demand in plasma load characteristics and MS crafts under the pulse conditions.A 10 kW prototype is de- signed.Experimental results show that the power supply has multi-variable pulse output characteristics and excellent ca- pability in arc management, the design provides important technical support for the promotion of crafts of MS.
出处
《电力电子技术》
CSCD
北大核心
2013年第11期86-88,共3页
Power Electronics
基金
陕西省科技厅产业化项目(2011K09-05)~~
关键词
电源
磁控溅射
复合调制
电弧管理
power supply
magnetron sputtering
complex modulation
arc manage
