纳米光波导光滑技术研究进展

Research development of nano optical waveguide smoothing technology

随着半导体工业的发展,集成光电器件的特征尺寸越来越小,纳米光波导表面光滑技术将面临新的挑战。降低纳米光波导表面粗糙度,制造超低损耗纳米光波导,实现其高效片间光互连与片内光耦合,是集成光电子器件,特别是高灵敏微陀螺、生化传感器、光通讯等器件发展的关键。主要分析了光波导表面粗糙度与传播损耗的关系,着重阐述纳米光波导表面光滑工艺方法,包括热氧化法、氢退火法及激光束法的研究现状及最新进展,总结了各类工艺的技术难点与发展前景,并展望其在微机电、光集成方面应用前景。

With the development of semiconductor industry,the critical dimension of integrated optoelectronic devices are becoming smaller and smaller, the technology of smoothing nano optical waveguide surface are facing new challengs. Reducing the nano optical waveguide surface roughness, manufacturing ultra-low loss nano optical waveguide and achieving the efficient optical interconnection and inside coupling between chips are the key to optoelectronic devices integration and especially the development of high sensitive micro gyro, biochemical sensors, optical communication devices and so on. In this review, the relationship between surface roughness and scattering loss were analyzed while the emphasis was the technological approaches of smoothing nano optical waveguide surface, including the research status and the latest achievements of thermal oxidation method, hydrogen annealing method and laser reformation method. Additionally, the technical difficulties and development prospects of various technologies were summarized together with their application prospects in the fields of MEMS, large-scale photonic integrated circuits.