摘要
采用直流等离子体射流CVD法在硬质合金 (WC + 8wt.%Co)基体上生长金刚石膜 ,主要借助XRD分析方法对CVD金刚石膜的微观结构和残余应力进行了研究 ,探讨了CVD金刚石膜中残余应力的形成及其对金刚石膜粘附性能的影响。研究结果表明 :CVD金刚石膜中通常存在GPa数量级的残余压应力 ,膜中存在适中的残余压应力 。
The diamond films have been produced on cemented carbide(WC+8wt%Co) substrates by method of DC plasma jet CVD. The microstructures and residual stresses of CVD diamond films have been studied mainly by analytical method of XRD. The formation of residual stresses in diamond films and its effect on adhesive properties of diamond films have been discussed. the results show as follows; Residual pressures with Gpa order often exist in CVD diamond films, a appropriate residual pressure exist in film is beneficial to get the best adhesive properties for CVD diamond film.
出处
《硬质合金》
CAS
2000年第4期233-235,共3页
Cemented Carbides
基金
广东省博士启动基金
广东省高教厅重点课题联合资助项目
