离子轰击产生湍层氮化硼

Turbostractic Boron Nitride Produced by Ion Bombardment

用高分辨率透射电子显微镜检查了Ｎ＋２离子轰击后的氮化硼样品．发现在片状六方形氮化硼ｓｐ２层的弯折区，有０．３５ｍｍ晶面间距的湍层氮化硼形成．虽然其形成机制尚不清楚，但是基于束流－固体相互作用观点的讨论可能是了解湍层氮化硼结构生长过程的关键所在．

Fine structures appearing in boron nitride(BN) sample bomparded by N+2 ion (60keV) were examined by JEM-200cx high-resolution transmission electron microscopy (HRTEM) at 200kV accelerating voltage. In the curved region of plate-like h-BN crystal sp2 sheets (spacing 0. 33nm), it was observed that the t-BN structure with an average interplaner spacing of 0. 35 nm was formed. Although the mechanism of formation of the t-BN structure is nuclear, it appears that our discussion based on the viewpoint of beam-solid interaction may be critical in understanding the growth process of the t-BN structures.