衬底温度对Ta_2O_5薄膜结构和光学性质的影响

Effect of substrate temperature on the structure and optical properties of the Ta_2O_5 thin film

采用直流磁控溅射法在不同衬底温度下(27、150、300、450和750℃)制备Ta2O5薄膜。利用X射线衍射、扫描电子显微镜(SEM)和紫外-可见光分光光度计对薄膜的结构、表面形貌和光学性质进行分析研究。实验结果表明,当衬底温度为450℃时,薄膜开始结晶。低于450℃,薄膜为无定形态,光学透过率随着衬底温度的升高而升高,在可见光区域最大透过率为85%。薄膜结晶生成晶粒,会对通过的光束产生散射,降低透过率,光学性能下降。这些结果说明衬底温度和薄膜材料的结构、结晶转变温度及光学性质密切相关。

Ta2 O5 thin films were prepared by reactive magnetron sputtering technique. The microstructure, morphology and optical properties of the films deposited at different substrate temperature were investigated by X- ray diffraction, scanning electron microscopy （SEM） and spectrophotometer. The Ta2O5 thin film begin to crystallized when substrate temperature reach to 450 ℃. The films were amorphous when temperature was less than 450℃, and the transmittance of thin films would increase with the enhancing substrate temperature. The highest transmittance during visible light region was 85%. In other hand, when the films were crystallization, they would produce a lot of crystalline particles, which would cause scattering, reduce the transmittance. The results showed that substrate temperature had a close relationship with the structure and crystalline properties and op- tical properties of the Ta2O5 thin films.