摘要
为满足589nm黄光激光器聚光元件双波段减反膜的使用要求,根据有效界面法设计原理设计膜系,以Ta2O5和SiO2为镀膜材料,使用TFC膜系设计软件对膜系进行优化,运用电子束蒸发方法和离子束辅助沉积方法,在零膨胀玻璃上镀制589nm反射率在2%~3%之间、1064nm反射率小于1%的双波段减反膜,通过膜系结构和工艺参数的优化解决了589nm反射率在2%~3%之间难以控制的问题,获得了符合聚光元件使用要求的减反射薄膜。
To meet the requirements of dual band antireflection coating which is applied to condensing element of yel- low tasers, film is designed by effective interface method design principle; Ta2O5 andSiO2 as coating materials are cho- sen; film is optimized by TFC film design software, with the aid of ion assistant deposition systems on zero-expansion glass electronic beaming vacuum depositing method is adopted .This dual band antireflection coating requires reflectivity between 2%~3% at 589 nm and less than 1% at 1064 nm. The problem of reflectivity uncontrolled between 2%43% at 589 nm is solved by optimizing membrane system structure and technological parameters. The antireflection coating which used on the collective optics is acquired.
出处
《长春理工大学学报(自然科学版)》
2013年第5期7-10,共4页
Journal of Changchun University of Science and Technology(Natural Science Edition)
基金
国家自然基金资助项目(60977052)
关键词
黄光激光器
双波段减反膜
离子束辅助沉积
有效界面法
yellow lasers
dual band antireflection coating
ion assistant deposition
effective interface method