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10.6μm激光分束镜的研制 被引量:1

Development of 10.6 μm Laser Beam Splitters
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摘要 本文针对激光分束镜的使用要求,着重介绍了10.6μm处1∶1分光且误差不超过±5%薄膜的研究与制备工艺。根据膜系设计基本理论,分别选取Ge和ZnS作为高、低折射率材料,借助膜系设计软件设计满足要求的膜层,并采用电子枪离子辅助沉积系统进行制备。通过优化镀膜工艺参数,在ZnS基底上制备了10.6μm处(透过率/反射率=49.5∶50.5)满足使用要求的薄膜,膜层具有较好的光学性能,其抗激光损伤、牢固度等性能指标均满足要求。 Based on using requirements of laser beam splitter, in this paper, the research and manufacture of 1∶1 beam split film at 10.6μm are mainly introduced whose error is less than 5%. According to the principle of film sys-tem, Ge and Zns are selected as high and low refractive index materials respectively.By using the film syetem design software,the film layers meet the requirements, at the same time, the electron gun and Ion assisted deposition sys-tem are also selected. By optimizing the coating process parameters, the beam split films (transmittance/reflectance=49.5:50.5) on ZnS substrate at 10.6μm are obtained,which meet the requirements.The film has good optical proper-ties,and the other indexes of film such as laser damage resistance and firmness properties also meet the requirements.
出处 《长春理工大学学报(自然科学版)》 2013年第5期37-40,共4页 Journal of Changchun University of Science and Technology(Natural Science Edition)
关键词 薄膜 激光分束镜 离子辅助沉积 牢固度 抗激光损伤 film laser beam splitter ion assisted deposition firmness laser induced damage
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