摘要
提出一种气膜反应器,用N2膜替代传统的水膜,并通过CFD流体软件对反应器内的温度场、流场进行模拟,主要研究了反应器内温度、流场分布情况及气膜对于反应器的保护作用。研究结果表明,多孔管内壁最高温度均低于550℃,远低于材料的耐温极限;由于N2的冷却隔离作用,多孔管内侧会形成一段亚临界区域,溶解无机盐,阻止无机盐在反应器多孔管内壁的沉积;同时通过离散相模型(DPM)模拟反应器内颗粒的运动轨迹,发现在纯流动情况下所有颗粒均不会接触反应器壁,气膜能够较好地保护反应器。
A gas-film reactor, which replaces the water-film by N2, is provided in this study. CFD simulation software is used to simulate the thermal field and flow field in the reactor. The aim is to study the effect of gas-film to protect the reactor. The results show that the highest temperature of porous tube is lower than 550℃, which is far lower than the heat-resistant limitation of material. Due to the cooling and insulation of N2, a subcritical region which can dissolve the inorganic salts and prevent inorganic salts from binding in the porous tube wall is produced near the porous tube. The tracks of particles are also simulated by using the DPM model. It is found that all particles are not connected with the reactor wall. Therefore, the gas-film can protect the reactor very well.
出处
《现代化工》
CAS
CSCD
北大核心
2013年第11期110-114,共5页
Modern Chemical Industry
