磁控溅射镀膜附着力的优化机制研究

Magnetron sputtering coating adhesion optimization mechanism research

复杂元器件上采用磁控溅射镀膜,薄膜与基片结合强度关系产品质量。从薄膜的附着机理入手,构建其结合力学模型。通过实验分析得出,附着力主要与附着类型、附着力的性质、工艺和测量方法有关。影响附着力的因素主要包括材料性质、基片表面状态、基片温度、沉积方式、沉积速率和沉积气氛等。掌握简单附着、扩散附着、通过中间层附着及宏观效应附着内容,通过选择基片能与薄膜形成化学键,清洗基片去除污染层,合理提高温度、加速扩散反应形成中间层等措施来提高附着力。此外,薄膜中存在的内应力通过合理调控工艺指标来消除和减小对薄膜和基片附着力的影响。

The magnetron sputtering coating is used on complex components, the relationship between film and substrate bonding strength the quality of the product. From the adhesion mechanism of thin film, build the mechanics model. Through the experimental analysis, adhesion main associated with attachment type, adhesion properties, process and methods of measurement. Factors affecting adhesion mainly includes material properties, the substrate surface state, way of substrate, deposition temperature and deposition rate and deposit atmosphere, etc. Master the simple diffusion of adhesion, adhesion, adhesive content through the middle layer adhesion and macro effect, can through the choice of substrate and thin film form chemical bonds, clean substrate to remove pollution layer, the reasonable measures to improve, such as temperature, accelerate the diffusion reaction to form the middle layer to improve adhesion. In addition, the internal stress existing in the thin film by reasonable control process indicators to eliminate and reduce the impact on the film and substrate adhesion.