摘要
文章系统阐述了高Tcbolometer的工作原理及性能优势;简要介绍了采用负胶光刻和湿法(化学)刻蚀技术在5×10mm2GdBa2Cu3O7-x薄膜上制备2×2阵列高Tcbolometer器件的工艺过程;并对此工艺优劣性进行了分析。
Not only is the operating principle of the high Tc bolometer illustrated systematically in this article,but also the superiority in character is elucidated at length here.In the meantime,the article briefs the process of preparing and developing the super_conductive devices of the high Tc bolometer in formation 2 times 2 on the film with a size of 5×10mm 2 GdBa 2Cu 3O 7-x through the technologies of phototeching of negative_working photoresist chemical film corrosion.Furthermore,the article analyzes the advantages and disadvantages of the operating process.
出处
《陕西工学院学报》
1999年第4期54-55,59,共3页
Journal of Shaanxi Institute of Technology
关键词
负胶光刻
化学刻蚀
高温超导薄膜红外探测器
super_conductive
bolometer
negative-working photoresist
chemical film corrosion