氯化物体系三价铬镀铬沉积速率的影响因素

Influencing factors of deposition rate for trivalent chromium plating in chloride system

开发了Trich-6561氯化物体系三价铬快速电镀装饰铬工艺,研究了温度、pH、配位剂含量等因素对铬沉积速率的影响,并制定了这些参数的工艺范围。在10 A/dm2电流密度下,镀铬速率达0.2μm/min,优于传统三价铬电镀装饰铬工艺。镀层厚度在0.4μm以上,表面呈蓝白色、光滑、无裂纹,中性盐雾试验120 h或乙酸盐雾试验72 h不变色。

A Trich-6561 process for rapid decorative trivalent chromium plating in chloride system was developed. The effects of temperature, pH, and complexing agent on chromium deposition rate were studied, and the ranges of these process parameters were determined. The chromium deposition rate reaches 0.2 μm/min at a current density of 10 A/dm2, which is superior to that of the conventional decorative trivalent chromium plating process. The chromium coating has a thickness of more than 0.4μm and a blue- white, smooth and crack-free surface, and does not tarnish after neutral salt spray test for 120 h or acetic acid-salt spray test for 72 h.