一锅法制备温敏改性纳米二氧化硅

Preparation of Thermosensitive Modified Nano-silica by One-pot Method

通过一锅法,制备得到温敏改性的SiO2。考察了反应温度、单体用量、反应时间、引发剂用量等因素对接触角的影响。利用傅里叶变换红外光谱仪(FTIR)和透射电子显微镜(TEM)对产物进行了表征。温敏改性纳米SiO2的最佳工艺条件为:反应温度73℃,反应时间6 h,单体与KH-570摩尔比为1∶1,引发剂用量为单体与KH-570总质量的2.5%。

Thermosensitive modified nano-silica was prepared by one-pot method. The effects of factors, such as reaction temperature, monomer amount, reaction time and initiator amount on the contact angles were investigated. The samples were characterized by means of Fourier transform infrared spectroscopy and transmission emission microscope. The optimum conditions for the preparation of thermosensitive modified nano-silica were determined as follows：reaction temperature 73℃, reaction time 6 h, molar ratio of monomers to T-methacryloxypropyl trimethoxy silane 1 ： 1, the amount of initiator monomer 2.5% of the total mass amount of monomer and T-methacryloxypropyl trimethoxy silane.