摘要
数值研究平衡电流位形对电阻壁模式稳定性的影响.研究发现,对于不同的电流位形,当等离子体边缘处安全因子一定时,最不稳定的电阻壁模的环向模数和极向模数相同.在同一壁位置下,非均匀电流位形驱动的电阻壁模的线性增长率比均匀电流位驱动的电阻壁模的线性增长率大.等离子体速度流在不同的初始电流位形下对电阻壁模稳定性的影响不同.由于磁力线在壁上的挤压,经过线性演化后,电阻壁模进入非线性演化并达到饱和状态,非均匀电流位形下的扰动磁能比均匀电流位形下的扰动磁能饱和度低.
Effect of equilibrium current profile on resistive wall mode stability are numerically studied. The most unstable mode with different equilibrium current profiles under fixed safety factor at plasma surface has same poloidal number and toroidal number. At same wall location, linear growth rate of （ 3, 1 ） mode of non-uniform current profile is greater than that of uniform current profile. Effect of plasma flow on resistive wall mode stability is different with different current profiles. After linear evolution, RWM saturates at nonlinear phase. Saturation can be attributed to flux piling up on resistive wall. Saturation level of non-uniform current profile is lower than that of uniform current profile.
出处
《计算物理》
CSCD
北大核心
2013年第6期902-908,共7页
Chinese Journal of Computational Physics
基金
山东省自然科学基金(ZR2012AQ025)
国家自然科学基金(11175156)
山东青年政治学院重点研究基金(2013ZD09)资助项目
关键词
电阻壁模
平衡位形
稳定性
饱和
resistive wall mode
equilibrium profile
stability
saturation
