工艺条件对水热电化学沉积HA/TiO_2涂层的影响

Effect of process conditions on HA/TiO_2 coating deposited by hydrothermal-electrochemical deposition

采用微弧氧化法在钛合金表面制备出含有钙磷元素的TiO2氧化膜,利用水热电化学法制备了HA/TiO2涂层。借助SEM、XRD对涂层的表面形貌、物相组成进行了分析,研究了电流密度、温度和沉积时间对水热电化学沉积HA/TiO2涂层的影响。结果表明,含钙磷TiO2层有利于水热电化学方法生长HA,得到的HA晶体分布均匀、致密;随着温度的升高,HA晶体尺寸呈增大趋势;在一定范围内,HA晶体尺寸随沉积时间的延长呈增大趋势,若沉积时间过长,则HA晶体尺寸会出现异常粗大的现象;HA晶体尺寸随电流密度的升高变化不大。

TiO2 oxide films containing calcium and phosphorus were prepared by micro-arc oxidation （MAO） on titanium alloy surface, HA/ TiO2 coatings were prepared by using the hydrothermal-electrochemical method. The surface morphologies and phase compositions of coatings were analyzed by means of SEM and XRD, the effect of current density, temperature and deposition time on HA/TiO2 coating deposited by hydrothermal-electrochemical method was studied. The results show that the TiO2 layer containing calcium and phosphorus contribute to the growth of HA in the hydrothermal-electrochemical process. HA crystals are well-distributed and compact in the coatings. The dimension of HA crystal remarkably increases with the temperature increasing. The dimension of HA crystal increases with the deposition time increasing within certain limits, but the dimension of HA crystal is abnormally large if the deposition time too long. The dimension of HA crystal changes slightly with the current density increasing.