H_2对类金刚石薄膜性能影响的研究

Influences on Properties of DLC Coatings by H_2 Content

类金刚石膜因其高的硬度、高的介电性、低的摩擦系数、优异的光学和化学性能以及巨大的潜在应用前景而成为研究热点。采用离子增加化学气相沉积方法在Si基底表面制备含氢类金刚石薄膜,通过XPS能谱测试,确定膜层的成份组成,膜层中除了含有碳以外还含少量的吸附的氧。调节反应源气体中H2的比例,结果表明H2的含量直接影响DLC薄膜的性能。随着H2的含量增大,膜层的表面粗糙度降低,膜层的硬度变大,而应力相应增大。这是由于反应源气体中H2含量的增加,DLC薄膜中氢的含量反而降低,膜层内sp2团簇结构的无序性增加,sp3键的比例增加,这将使得膜层内的碳的空间网络结构所占的比例增加。

Diamond-like carbon （DLC） films have been largely studied due to their properties of high mechanical hard- ness, high electrical resistivity, low friction coefficient, optical transparency and chemical inertness and their high poten- tial in many industrial applications. DLC films were deposited in an RF parallel plate plasma reactor using various val- ues of process pressure and gas mixture. The films were analyzed by X-ray photoelectron spectroscopy（XPS）. By changing the content of H2 to dilute C4H10 and increase the percentage of H2 in the reacting source gas, to a certain ex- tent, the hardness and stress of the prepared DLC films have been increased, while surface roughness of the films have been decreased. And values for the content of sp3 bonded carbon has been increased.