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Mass Deposition,Etching and Sputtering Effects of Low-Energy N^+Ion Irradiation on Solid Fly Ash

Mass Deposition,Etching and Sputtering Effects of Low-Energy N^+ Ion Irradiation on Solid Fly Ash
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摘要 Fly ash is an industrial waste created when coal is burned to generate electrical power. In the present study, we used low-energy nitrogen ion implantation on fly ash to improve its surface properties. Scanning electron microscope (SEM), fourier transform infrared spectroscopy (FTIR), X-ray photoelectron spectroscopy (XPS) and inductively coupled plasma-atomic emission spectroscopy (ICP-AES) were used to study the changes of physical and chemical properties of fly ash after N+ ion implantation, and the mechanism of fly ash modified by ion implantation. In the optimal implantation with energy of 5 keV and dose Of 15D0, the ion beam could effectively increase the specific surface area (approximately 150% increase) of the fly ash. Lots of scratches were generated in the surface of the fly ash after N+ ion implantation, therefore it is good for enhancing the specific surface area. Experimental results show that the ion implantation could open the chemical bonds of Si-O, Si-A1 and Al-O, and deposit nitrogen ions on the surface of fly ash. Fly ash is an industrial waste created when coal is burned to generate electrical power. In the present study, we used low-energy nitrogen ion implantation on fly ash to improve its surface properties. Scanning electron microscope (SEM), fourier transform infrared spectroscopy (FTIR), X-ray photoelectron spectroscopy (XPS) and inductively coupled plasma-atomic emission spectroscopy (ICP-AES) were used to study the changes of physical and chemical properties of fly ash after N+ ion implantation, and the mechanism of fly ash modified by ion implantation. In the optimal implantation with energy of 5 keV and dose Of 15D0, the ion beam could effectively increase the specific surface area (approximately 150% increase) of the fly ash. Lots of scratches were generated in the surface of the fly ash after N+ ion implantation, therefore it is good for enhancing the specific surface area. Experimental results show that the ion implantation could open the chemical bonds of Si-O, Si-A1 and Al-O, and deposit nitrogen ions on the surface of fly ash.
出处 《Plasma Science and Technology》 SCIE EI CAS CSCD 2013年第12期1232-1236,共5页 等离子体科学和技术(英文版)
基金 supported by National Natural Science Foundation of China(No.20976183)
关键词 fly ash nitrogen ion DEPOSITED ETCHING SPUTTERING fly ash, nitrogen ion, deposited, etching, sputtering
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