高纯贵金属靶材在半导体制造中的应用与制备技术

Application and Fabrication Method of High Purity Precious Metal Sputtering Targets Used in Semiconductor

高纯Au、Ag、Pt、Ru贵金属及其合金溅射靶材是半导体PVD工艺制程中的溅射源材料,广泛用于半导体制造工艺中,成为保证半导体器件性能和发展半导体技术必不可少及不可替代的材料。材料的高纯化、高性能贵金属及其合金靶材的制备(金属熔铸、热机械处理、粉末烧结、焊接等)以及贵金属靶材残靶及加工余料残屑的提纯回收利用是研究发展的重点,以实现贵金属靶材产品的高效增值。

High-puritY Au, Ag, Pt, Ru precious metals and alloys material targets make a very v role in semiconductor manufacturing. Purifying of raw materials, fabricating of high performance target （melting casting, thermal mechanical processing, powder sintering and bonding, etc.）, recycling and refining of spent precious materials are important processes for precious metal target product development and application.