工艺因素对磁控溅射法制备钛酸锶钡薄膜性能的影响

Effects of Magnetron Sputtering Parameters on the Properties of BST Thin Films

磁控溅射技术在薄膜制备领域有着广泛的应用。本文在介绍磁控溅射法制备薄膜材料的基本原理和流程基础之上,详细分析了溅射工艺参数(溅射功率、温度、溅射气压、氧分压)对BST薄膜性能的影响,并提出了研究中需要解决的一些问题。

The method of magnetron sputtering deposition is widely applied in the field of the preparation of thin films. Effects of magnetron sputtering parameters （sputtering power, temperature, sputtering pressure, oxygen partial pressure） on the properties of BST thin films have been investigated on the basis of introducing basic principle and process of the magnetron sputtering method. Finally, some technical problems to be solved are discussed.