摘要
介绍了利用化学气相沉积(CVD)法制备钨系列产品(包括钨管、钨坩埚、钨异型件等纯钨产品和铜基/钨基/钼基/石墨基等涂层产品)的工艺流程及设备体系。CVD法制得的钨系列产品特点有:密度高,其密度值达到理论密度的98.5%以上;纯度高,钨含量达到99.999 9%;微观组织为柱状晶或多层柱状晶结构;涂层类产品钨与基体结合强度高。
Description is made of the process flowsheet and equipment system of tungsten series product preparation by chemical vapor deposition （CVD）, and the products include pure tungsten products of tungsten tube, tungsten crucible and tungsten special-shaped part, and coating products with copper base, tungsten base,molybdenum base and graphite base. The tungsten series products produced by CVD have the following characteristics： high density up to 98.5% of theoretical density,high purity of 99. 999 9% tungsten, particular microstructure of columnar crystal or multilayer columnar crystal, and high bond strength of tungsten with the matrix in the coating products.
出处
《稀有金属与硬质合金》
CAS
CSCD
北大核心
2013年第6期17-21,共5页
Rare Metals and Cemented Carbides
关键词
钨系列产品
化学气相沉积法
工艺流程
设备体系
材料特性
tungsten series product
chemical vapor deposition
process flowsheet
equipment system
material characteristic
