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结构防伪型印刷微镜阵列

Printing Micro-Mirror Array of Structure Security Type
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摘要 以微曲面反射光线亮度和反射光稳定度的雅可比行列式判据及CMYKS颜色模式为基础,建立了一种采用相位编码的CMYKS结构型印刷防伪微镜阵列模型。该模型利用正弦函数的周期性,通过调节结构参量达到微结构防伪的目的。 Based on the Jacobian determinant criterion of the micro surface reflective brightness and reflective stability and CMYKS color model, a class of CMYKS structural printing anti-counterfeiting micro-mirror array models using the phase encoding are established. The models utilize the periodicity of sine functions, adjust the structure parameters to achieve the purpose of anti-counterfeiting microstructure.
作者 苗泉龙 唐铖 吴智聪 王小赛 钱虎 唐梅 张逸新
机构地区 江南大学理学院 江南大学物联网工程学院
出处 《江南大学学报（自然科学版）》 CAS 2013年第6期748-752,共5页 Joural of Jiangnan University (Natural Science Edition)　
基金 江苏省高等学校大学生实践创新训练计划项目
关键词 CMYKS颜色模式 印刷防伪微镜阵列模型 微结构防伪 CMYKS color model, printing anti-counterfeiting micro-mirror array model, anti-counterfeitingmicrostructure
分类号 O432.3 [机械工程—光学工程]
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参考文献15

  • 1Lee R A. Generalised curvilinear diffraction gratings:Ⅱ.generalised ray equations and caustics[J].{H}OPTICA ACTA,1983,(03):291-301.
  • 2Lee R A. Generalised curvilinear diffraction gratings:Ⅰ.image diffraction patterns[J].{H}OPTICA ACTA,1983,(03):267-289.
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  • 7Lee R A. OVD microstructures for direct printing applications[A].Serrento,Italy:CSIRO Meterials Science and Engineering,2001.
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二级参考文献10

  • 1Lee R A. Generalised Curvilinear Diffraction Gratings: II. Gen- eralised ray equations and caustics[J]. Optica Acta, 1983, 30 (3) :291-301.
  • 2Lee R A. Generalised Curvilinear Diffraction Gratings: I. Image diffraction patterns[J]. Optica Acta, 1983, 30(3):267-289.
  • 3Jackson W K, Richard A. Diffraction grating[P]. US: 5335113, 1994-08-02.
  • 4Lee R A. Diffraction grating and method of manufacture[P]. US: 5428479, 1995-06-27.
  • 5Lee R A. Microtechnology for anti-counterfeiting[J]. Microelec- tronic'Engineering, 2000,53: 513-516.
  • 6Lee R A. OVD microstructures for direct printing applications [C]. Intergraf, XVIIIth, International Security Printers Confer- ence, Sorrento, Italy,2001.
  • 7Lee R A. Coloutone lithography[J]. Microelectronic Engineer- ing, 2002,61=105-111.
  • 8Lee R A. Optical device and methods of manufacture[P]. US: 7281810B2, 2007-01-02.
  • 9Lee R A. Micro mirror array nanostructures for antl-counter- feiting applications[J]. Optical Security and Counterfeit Deter- rence Techniques V, 2004,5310, 350-368.
  • 10张泽全,沈国土,蔡继光,饶小红,庄松林.亚波长光栅衍射效率特性设计的遗传算法优化[J].光学技术,2009,35(4):587-590. 被引量：1

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江南大学学报（自然科学版）
2013年 第6期

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