摘要
采用射频磁控溅射方法制备了非晶CNx薄膜。利用纳米硬度计研究了薄膜沉积过程中基体负偏压对薄膜硬度和弹性的影响。利用X光电子能谱分析了CNx薄膜的结构。另外 ,还研究了在微动摩擦实验中振动频率、振幅和载荷对摩擦系数的影响。
Amorphous carbon nitride thin films were prepared by reactive radio frequency magnetron sputtering method.The effect of negative substrate bias voltage on nanohardness of the films was studied with nanoindentation technique.The structure of the carbon nitride films was characterized by X ray photoelectron spectrometer.Furthermore,in fretting test,the influence of vibration frequency,displacement amplitude and normal load on friction coefficient of the carbon nitride thin films was studied.
出处
《真空科学与技术》
EI
CSCD
北大核心
2000年第6期381-384,共4页
Vacuum Science and Technology
基金
国家自然科学基金!资助项目 (5 9735 110 )