钛基体中离子注入镍和钼的电催化活性

The Electrocatalytic Activity of Nickel and Molybdenum Implanted in Titanium Substrates

Grenness等发现,铂离子注入钨基体中,对H^+还原产生的电催化性能与纯铂相近,此后,Wolf等用离子注入和离子束混合技术制作了多种电极,其中Pt/RuO_2、Pt/C、Pt/WC电极用于H^+和O_2的电还原以及甲醇和甲酸的电氧化,其催化活性和稳定性均优于光滑的纯铂电极,目前,在其它方法制作的析氢电极材料中,最可能用于工业电解槽的为NiMo合金电极和复合Raney镍合金电极,本工作将镍和钼离子注入到钛基体中,研究了此电极在30 wt％KOH溶液中析氢电催化行为,并通过电子探针显微分析(EPMA)和X射线光电子能谱(XPS)分析,检测了离子注入电极的表面成分、注入元素的浓度分布及价态。

The catalyst was prepared by implanting Ni and Mo into Ti substrates. Ti was implanted with 1×1016 ions· cm-2 of Ni and 1×1016-1×1017 ions · cm-2 of Mo. The concentration profiles of Ni and Mo implanted were measured by XPS. The quantitative measurements show that the concentration profiles of Ni and Mo in Ti are approximately Gauss profiles. The current density potential curves of the cathodic hydrogen evolution reaction show that Ni and Mo implanted into Ti electrode exhibit a low hydrogen overvoltage (110-180 mV at 25℃, 200-400 mA· cm-2, in 30 wt% KOH) and an excellent stability. The observed electrocatalytic activity is explained provisionally by an interaction between the ions implanted in Ti.