半导体纳米线制备中干法刻蚀技术的研究

Preparation of Semiconductor Nanowires by Dry Etching Technique

近年来,一维纳米结构:纳米管、纳米线、纳米带等,引起了人们的广泛关注。如何制备高质量的纳米结构依然是我们面临的巨大挑战。该文通过干法刻蚀技术制备的纳米线阵列来突出说明该技术今后的发展是多样化的,而且仍然方兴未艾。

In recent years,one-dimensional nano-structures：nanotubes,nanowires,nanobelts,etc,have arou- sed widespread concern.How to prepare high-quality nano-structures remains a great challenge.This arti- cle goes to the end with emphasizing that dry etching technique will be diversified and just unfolding.