CVD法与PCVD法TiN薄膜研究

Investigation on TiN Coating by CVD and Pulsed D. C. PCVD methods

用等离子体增强化学气相沉积 (PCVD)法和化学气相沉积 (CVD)法分别制备 Ti N系薄膜。采用扫描电镜、X射线衍射仪和连续加载压入仪研究分析薄膜的微观结构、相结构和薄膜的力学性能 ,并采用电极电位法测定了薄膜的耐腐蚀性能。研究表明 :PCVD法 Ti N系薄膜的微观组织形态明显优于同类的 CVD法薄膜 ,PCVD法薄膜晶粒尺寸细小、均匀 ,形态圆整 ,组织致密 ;CVD法薄膜晶粒形态为多边形 ,尺寸较粗大、不均匀 ,组织致密性差 ;PCVD法 Ti N系薄膜的韧性和结合力等力学性能可达到或优于同类 CVD法薄膜 ;虽然 PCVD法薄膜的氯含量 (约为 2 % )远高于 CVD法薄膜 (约为 0 .5 % ) ,但 PCVD法薄膜的耐蚀性能却明显优于 CVD法薄膜。还研究分析了 PCVD法和CVD法成膜模式对薄膜微观结构和性能的影响机理。

A pulsed D.C plasma chemical vapor deposition in industrial set up for deposition of TiN coatings on cemented carbide SC30 was performed. The microstructure and performance of TiN coatings by CVD and pulsed D.C.PCVD methods were investigated. Microstructure of coatings was studied by SEM and XRD. It was found that the microstructure of PCVD TiN coatings was much finer and regular in shape than that of CVD coatings. The morphology of the PCVD coating is with fine and spherical grain shape,while the grain of CVD coating was polygonal. The toughness and adhesion of the coatings were examined by the indentation method. It was shown that the toughness and adherence of PCVD TiN coating were better than that of CVD coatings.