氮气流量对(Ti,Al,Si,Cr)N超硬薄膜的结构与性能的影响

Effect of nitrogen flow on microstructure and mechanical properties of (Ti,Al,Si,Cr) N superhard film

采用等离子增强磁控溅射技术(PEMC)在YG8硬质合金表面制备了(Ti,Al,Si,Cr)N超硬膜,研究了N2流量对膜层结构、成分、形态特征与性能的影响。结果表明,所得薄膜为面心立方结构,随N2流量增加,薄膜的晶体学取向由(111)晶面向(200)晶面转变。薄膜表面呈现柱状晶形态,N2流量为70 sccm(标况mL/min)时,柱状晶尺寸最小,粗糙度最低。所得薄膜的硬度随N2流量的增加先增大后减小,N2流量为70 sccm时,达到最大值35.70 GPa。

（Ti, Al, Si, Cr）N superhard films were deposited on YG8 hard metal substrate by plasma enhanced magnetron sputtering technology. Effects of nitrogen flow on the microstructure, composition, morphology and mechanical properties of deposited films were investigated. The results indicate that the （Ti, Al, Si, Cr）N superhard films have face-centered cubic crystal structure. The preferred orientation of （ Ti, Al, Si, Cr） N superhard films changes from （ 111 ） to （200） with increase of nitrogen flow. The morphology characteristics of the films appear columnar structure under the different nitrogen flows. However, the size of columnar structure and the surface roughness become the finest at the nitrogen flow of 70 sccm. The hardness of deposited films increases with increasing nitrogen flows initially and decreases afterwards. The maximum hardness reaches 35.70 GPa at the nitrogen flow of 70 sccm.