电化学自组装法制备透明ZnO薄膜及性能研究

Fabrication of Transparent Zinc Oxide Film with Electrochemical Deposition

以低浓度的Zn(NO3)2为电解液、KCl为支持电解质,采用电沉积自组装法在氧化铟锡(ITO)玻璃基片上成功制备了尺寸可控、性能优异、具有强的C轴择优取向生长的纳米柱ZnO薄膜;并进一步获得了六方晶体纳米结构的ZnO薄膜的优化沉积工艺.同时,结合X射线衍射(XRD)、扫描电镜测试(SEM)、透射电镜(TEM)、紫外吸收光谱(UV-vis)等测试手段对薄膜的形貌、晶形及光学性能进行了系统表征.结果表明,制备的ZnO薄膜为六方纤锌矿结构,且沿[002]方向的择优生长趋势明显、物相纯正;该薄膜的透射率最大值可达75%,禁带宽度接近于3.28 eV.

Zinc oxide（ZnO） films were electrodeposited from low concentration of Zn （NO3）2 as electrolyte on the ITO substrates.The electrochemical method has the ability to “tailor” deposited structure, properties and to form a high-aspect-ratio ZnO film.And optimized condition hexagonal crystal of ZnO film has been determined ultimately .The morphology , microstructure and optical performance of ZnO films were characterized by scanning electron microscopy （SEM）, transmission electron microscopy （TEM） , X-ray diffraction （XRD） etc.The effects on different concentra-tions of Zn 2＋, NO3 -and Cl -in electrolyte on the growth of ZnO nanopillars were studied .The results showed that ZnO nanocrystalline thin films has wrutzite structure and growth tendency of [002] orientation obviously .Optical char-acterizations showed that the maximum value of optical transmittance of the film up to 75%, the optical bandgap energy value was about to 3.28 eV.