金属Ti/Cu多层膜紫外光反射性能研究

Study on UV Optics Reflecting Characteristics of Ti/Cu Metal Multilayer Films

采用直流磁控溅射方法制备Ti/Cu和Cu/Nb多层金属反射膜 ,并对膜的紫外光反射性能进行研究 ,发现该膜的反射性能与基片的结构和温度、多层膜的周期和结构有关。选用取向为 (10 0 )的单晶Si为基片 ,在基片温度为 470℃左右、多层膜的周期为 3 0时 ,膜的结晶性较好。且多层膜的反射率随波长的减小而增加 ,在波长为 2 5 0nm时 ,反射率可达到 65 %

Metal multilayer films with a high reflectivity at 5-degrees from normal incidence in the UV spectral region have been deposited by DC magnetron sputtering system.The reflectivity of the metal multilayer films is dependent on the deposition environment, substrate structure and number of pair layers. The films fabricated on Si (100) substrate, about 470℃ substrate temperature and with 30 pair layers have a high reflectivity which is about 65% at 250nm. Precise structural analysis of Ti/Cu multilayer films deposited by DC magnetron sputtering system has been made using X-ray diffraction.