摘要
利用脉冲多弧离子镀技术在硅基底上沉积类金刚石薄膜。分析了类金刚石薄膜的硬度和工艺参数的关系 ,讨论了薄膜的耐磨性和化学稳定性。
DLC films were prepared on silicon by pulse-arc plasma deposition. The relationship between hardness of the deposited films and deposition parameters were analysed in detail. Wear resistance and chemical inertness of the deposited films are also studied.
出处
《机械科学与技术》
CSCD
北大核心
2001年第1期100-101,105,共3页
Mechanical Science and Technology for Aerospace Engineering
