Ar^+刻蚀对MoS_2润滑膜分子结构的影响

Structural Change of Single Crystal MoS2 and MoS2 Lubrica ting Coatings Deposited with Various Techniques during Ar+ Ion Etching in XPS and AES Analysis

采用 Ar+ 离子溅射源进行 XPS和 AES剖面分析 ,结果发现 ,Ar+ 对 Mo S2 分子中的 S原子产生“择优”选择刻蚀并随之生成非化学计量比的 Mo Sx,Mo原子被还原 ,Mo3d结合能值向低端位移约 1.7e V.应该注意的是 ,采用 Ar+ 溅射进行 XPS剖面分析时不能确定材料表面和界面元素的化学价态 ,S/ Mo原子比同实验值之间亦存在差异 ,故应采用有关软件对实验结果进行修正 .

XPS and AES depth profiles of Mo and S in MoS2 lubricating coating made by various surface engineering techniques were obtained on PHI-5702 multi-functional X-ray photoelectron spectroscope in the presence of Ar+ ion-beam etching. The effect of Ar+ ion-beam etching on the changes in the structure and chemical states of MoS2 lubricating coating was investigated. As the results, Ar+ ion-beam etching causes preferential selective etching of S2- in MoS2 with the generation of non-stoichiometric MoSx. At the same time, Mo4+ in MoS2 is reduced during the etching process, hence the binding energy of Mo3d shifts to low value. Moreover, single crystal MoS2 and MoS2 lubricating coating based on different surface treatment techniques show different responses to Ar+ ion-beam etching. In other words, they give different Mo/S ratios after Ar+ ion-beam etching, because of the generation of different non-stoichiometric MoSx compounds.