全自动光刻版清洗机介绍

Introduction to the automatic photomask cleaning equipment

介绍了中国电子科技集团公司第四十五研究所研制的全自动光刻版清洗机的工艺原理和工作过程。该设备自用户投入使用以来,大量的产品证明,采用全自动光刻版清洗机对光刻版进行清洗,光刻版洁净度高,工艺效果理想,工艺参数稳定,自动化程度高,批量处理能力强,可以广泛用于工业生产中。

Photomask cleaning processes are introduced, and the operating of the Automatic Photomask Cleaning Equipment designed by the 45th Research Institute of CETC is present. The experiments proved that the Automatic Photomask Cleaning Equipment is effective, and can be widely used in the cleaning of the photomask.