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Simulation of Reactive Distillation Process for Monosilane Production via Redistribution of Trichlorosilane

三氯氢硅歧化反应精馏生产硅烷的模拟(英文)
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摘要 The reactive distillation process for producing high purity monosilane via trichlorosilane redistribution reaction was simulated. Rigorous RadFrac block was employed in Aspen Plus simulation package. Accurate results could be given when the chemical kinetics was taken into account in the equilibrium stage model. A single column process was used for the verification of previous studies. The results showed that 99.9% purity monosilane could be achieved in the reactive distillation. A pumparound block was employed to reduce the condenser duty with inexpen-sive coolant. The effects of operating pressure, feed stage location, liquid holdup per stage and pumparound location were also investigated. The energy consumption was limited, but the refrigerant temperature was too low, which is the fatal disadvantage. Therefore, a double columns process was developed to increase the condenser tem-perature. The simulation results demonstrated that a reasonable temperature could be achieved by varying the recycle stream location. The reactive distillation process for producing high purity monosilane via trichlorosilane redistribution reaction was simulated. Rigorous RadFrac block was employed in Aspen Plus simulation package. Accurate results could be given when the chemical kinetics was taken into account in the equilibrium stage model. A single column process was used for the verification of previous studies. The results showed that 99.9% purity monosilane could be achieved in the reactive distillation. A pumparound block was employed to reduce the condenser duty with inexpen- sive coolant. The effects of operating pressure, feed stage location, liquid holdup per stage and pumparound loca- tion were also investigated. The energy consumption was limited, but the refrigerant temperature was too low, which is the fatal disadvantage. Therefore, a double columns process was developed to increase the condenser tem- perature. The simulation results demonstrated that a reasonable temperature could be achieved by varying the recy- cle stream location.
出处 《Chinese Journal of Chemical Engineering》 SCIE EI CAS CSCD 2014年第3期287-293,共7页 中国化学工程学报(英文版)
关键词 reactive distillation reaction kinetics trichlorosilane redistribution pumparound monosilane 反应精馏过程 再分配反应 数值模拟 三氯氢硅 甲硅烷 生产 冷却冷凝器 Aspen
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