摘要
本文介绍用正、负光致抗蚀剂组合的方法,制造用于DFB激光器λ/4相移光栅的原理及工艺,并给出了研究结果和质量评价。光栅周期为4600A,相移转换区小于3μm。
λ/4-shifted grating for DFB lasers has been successfully fabricated by the method of positive and negative photoresist. In this paper, the principle and fabrication process are described in detail, and the results and the quality evaluation are presented. The corrugation periods were about 4600A The quarter-wave phase shift transition width of the gratings were less than 3μm.
出处
《光通信研究》
1991年第4期34-37,共4页
Study on Optical Communications
